Adhesion control between resist patterns and photomask blank surfaces

Masaaki Kurihara; Sho Hatakeyama; Kouji Yoshida; Takaharu Nagai; Daisuke Totsukawa; Masaharu Fukuda; Yasutaka Morikawa; Hiroshi Mohri; Morihisa Hoga; Naoya Hayashi; Hiroyuki Ohtani; Masamichi Fujihira

doi:10.1117/12.824251

11 May 2009 Adhesion control between resist patterns and photomask blank surfaces

Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Takaharu Nagai, Daisuke Totsukawa, Masaharu Fukuda, Yasutaka Morikawa, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi, Hiroyuki Ohtani, Masamichi Fujihira

Author Affiliations +

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73790A (2009) https://doi.org/10.1117/12.824251
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

Most problems in photomask fabrication such as pattern collapse, haze, and cleaning damage are related to the behavior of surfaces and interfaces of resists, opaque layers, and quartz substrates. Therefore, it is important to control the corresponding surface and interface energies in photomask fabrication processes. In particular, adhesion analysis in microscopic regions is strongly desirable to optimize material and process designs in photomask fabrication. We applied the direct peeling (DP) method with a scanning probe microscope (SPM) tip and measured the adhesion of resist patterns on Cr and quartz surfaces for photomask process optimization. We measured adhesion and frictional forces between the resulting collapsed resist pillar and the Cr or the quartz surface before and after the sliding. We also studied the effect of surface property of the Cr and quartz surfaces to resist adhesion. The adhesion could be controlled by surface modification using silanes and surface roughness on Cr blanks. We also discuss the relationship between the adhesion observed with the DP method and the properties of the modified surfaces including water contact angles and local adhesive forces measured from force-distance curves with an SPM.

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Masaaki Kurihara, Masaaki Kurihara, Sho Hatakeyama, Sho Hatakeyama, Kouji Yoshida, Kouji Yoshida, Takaharu Nagai, Takaharu Nagai, Daisuke Totsukawa, Daisuke Totsukawa, Masaharu Fukuda, Masaharu Fukuda, Yasutaka Morikawa, Yasutaka Morikawa, Hiroshi Mohri, Hiroshi Mohri, Morihisa Hoga, Morihisa Hoga, Naoya Hayashi, Naoya Hayashi, Hiroyuki Ohtani, Hiroyuki Ohtani, Masamichi Fujihira, Masamichi Fujihira, } "Adhesion control between resist patterns and photomask blank surfaces", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790A (11 May 2009); doi: 10.1117/12.824251; https://doi.org/10.1117/12.824251

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