Study on surface integrity in photomask resist strip and final cleaning processes

Sherjang Singh; Stefan Helbig; Peter Dress; Uwe Dietze

doi:10.1117/12.824254

11 May 2009 Study on surface integrity in photomask resist strip and final cleaning processes

Sherjang Singh, Stefan Helbig, Peter Dress, Uwe Dietze

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73790D (2009) https://doi.org/10.1117/12.824254
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

In recent years, photomask resist strip and cleaning technology development was substantially driven by the industry's need to prevent surface haze formation through the elimination of sulfuric acid from these processes. As a result, ozone water was introduced to the resist strip and cleaning processes as a promising alternative to a Sulfuric - Peroxide Mixture (SPM). However, with the introduction of 193i double patterning, EUVL (Extreme Ultraviolet Lithography) and NanoImprint Lithography (NIL) the demand on CD-linewidth control and surface layer integrity is significantly expanded and the use of ozone water is questionable. Ozone water has been found to cause significant damage to metal based mask surface layers, leading to significant changes in optical properties and CD-linewidth shift. In this paper HamaTech APE demonstrates the use of an alternative acid-free resist strip and cleaning process, which not only overcomes the named drawbacks of conventional ozone water use, but reduces resist strip time by 50% to 75%. The surface materials investigated during this study are; chrome absorber layers on binary masks, MoSi based shifters, chrome hard mask layers on EPSM, and ruthenium capping layers on EUV masks. Surface material integrity and CD-stability results using this new, acid-free approach are presented in the following pages.

Citation Download Citation

Sherjang Singh, Stefan Helbig, Peter Dress, and Uwe Dietze "Study on surface integrity in photomask resist strip and final cleaning processes", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790D (11 May 2009); https://doi.org/10.1117/12.824254

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available