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11 May 2009 Haze growth on reticles: What's the RigHT thing to do?
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73790F (2009) https://doi.org/10.1117/12.824256
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
The authors are reporting on the comparison of various industry methods of managing, controlling and limiting haze growth on 193nm reticles. This comparison includes reporting on the results from the Reticle Haze Treatment (RigHT) process developed at Micron / Photronics Mask Technology Center and transferred to Photronics, Inc. This process provides 193nm PSM reticles that have shown no haze growth after excessive wafer exposures and are usable for the life of the reticle.
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Steven M. McDonald, Daniel V. Chalom, Michael J. Green, Jeffrey A. McMurran, Michael B. Garrett, and David W. Dlouhy "Haze growth on reticles: What's the RigHT thing to do?", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790F (11 May 2009); https://doi.org/10.1117/12.824256
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