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11 May 2009 Airborne molecular contamination detection method for photomasks and ultra purging decontamination
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73791G (2009) https://doi.org/10.1117/12.824293
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
While photomask prices continue to increase and their lifetime continues to be shortened due to molecular contamination, it is a key issue to understand the chemical mechanism of the mask damage caused by haze problem to save fabrication cost. We show a unique method for in-situ Airborne Molecular Contamination, or AMC, measurement in the mask carrier mini-environment as well as the small volume confined under the pellicle protective film. Additionally, an ultimate solution to decontaminate the photomask and surrounding environment with a vacuum purging system shows preliminary positive results on the extension of photomask life time by elimination of the haze problem cause.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hisanori Kambara, Arnaud Favre, Magali Davenet, and Dan Rodier "Airborne molecular contamination detection method for photomasks and ultra purging decontamination", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791G (11 May 2009); https://doi.org/10.1117/12.824293
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