11 May 2009 Evaluation of the flatness effects of mask backing and orientation during photomask pellicle mount
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73791R (2009) https://doi.org/10.1117/12.824303
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
As technology advances, the demand for tighter photomask final flatness specifications becomes greater. Studies have shown that the process of mounting a pellicle induces the largest change in flatness in photomask fabrication. Photomask pellicles play an important role in flatness due to the many components in the mounting process. For example, pellicle frame flatness, pellicle adhesive, mounting force, mounting time, mounting orientation and mask backing shape during mount all can play a role in changing the mask shape during pellicle mount. Many of these factors have been investigated over the last several years [1][2][3][4]. Recent studies have demonstrated that the height of the pellicle frame also has a significant impact on the final flatness with lower stand off frames resulting in reduced pellicle influence on mask distortion [5]. This paper will examine the flatness influence factor as a function of mounting direction and mask backing variations. For these experiments, the same pellicle frame was remounted for each set of experiments to eliminate external pellicle frame flatness factors and to minimize the amount of data deviations. Four different types of mask backing types were selected that differed in the contact area with the mask in particular pressure points. The mask backing types consist of a border frame, 4 point pressure points, a full backing plate (quartz substrate), and a pellicle frame. In addition to using the four different types of mask backings, the pellicles were also mounted both in the vertical and horizontal directions in determining final photomask flatness. This work demonstrates that frame flatness and shape play the largest roles and mounting force, backing plate and mounting orientation have less of an effect.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Mizoguchi, Takashi Mizoguchi, Satoshi Akutagawa, Satoshi Akutagawa, Monica Barrett, Monica Barrett, Michael Caterer, Michael Caterer, Robert Nolan, Robert Nolan, Kenneth Racette, Kenneth Racette, Dennis Plouffe, Dennis Plouffe, Nancy Zhou, Nancy Zhou, } "Evaluation of the flatness effects of mask backing and orientation during photomask pellicle mount", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791R (11 May 2009); doi: 10.1117/12.824303; https://doi.org/10.1117/12.824303

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