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11 May 2009 Evaluation for EAPSM life time by ArF pellicle characteristic
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73791S (2009) https://doi.org/10.1117/12.824304
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
As the nano-lithography technology continues to develop towards advanced generation of ArF immersion lithography, the quality of ArF EAPSM becomes the most valuable factor for worldwide Maskshop. Therefore outturn of ArF EAPMS increase continuously, and people who work in the fields of semiconductor engineering give consequence to good quality of ArF EAPSM until the EUV lithography generation. Because 300mm wafer litho-facility use higher exposure energy, wider shot field and more shots per a wafer for achieving more memory(DRAM or Flash) chips than 200mm exposure facility, photo engineer wants unchanged initial condition of mask quality(CD MTT, CD Uniformity, repeating defect, phase shift and transmittance). In other words, mask manufacturer must focus on the concept of ArF EAPSM 'life time'. We have investigated the influence grade inducing the lithographic variation between the growth of exposure energy based Haze phenomena, thin organic pellicle membrane characteristics, and we have verified that the ArF pellicle durability is one of the most important evidence for improvement of life time of ArF EAPSM. In this study, related with ArF EAPSM life time, we tried to evaluate the influence of ArF pellicle characteristic consisting of pellicle membrane transmittance strength (durability against ArF laser source) and non acid mask condition for the period of non Haze contamination without added re-pellicle → re-cleaning cycle. Metrological inspection and evaluation was conducted with several equipment and analysis including mask inspection, Scatterometer, IC, ArF laser accelerator.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kang Joon Seo, Ji Sun Ryu, Goo Min Jeong, Shin Cheol Kang, Yong Dae Kim, Sang Chul Kim, and Chang Yeol Kim "Evaluation for EAPSM life time by ArF pellicle characteristic", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73791S (11 May 2009); https://doi.org/10.1117/12.824304
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