11 May 2009 Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737929 (2009) https://doi.org/10.1117/12.824323
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
This paper describes a novel technology Variable Sensitivity Detection (VSD) for de-sensing SRAF nuisance defects in a mask inspection system. The point of our approach is to search the nearest thin-line to each defect candidate and estimate the line-width with transmitted and reflected images. The dependence of transmitted and reflected image contract on line-width is calculated with a rigorous model. This technology de-senses lineend shortening and edge roughness of SRAF patterns without compromising sensitivity to main features. Total counts of SRAF nuisance detection were drastically reduced. The VSD technology was implemented to a platform of Nuflare NPI-5000PLUS.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyoji Yamashita, Kyoji Yamashita, Nobuyuki Harabe, Nobuyuki Harabe, Masatoshi Hirono, Masatoshi Hirono, Yukio Tamura, Yukio Tamura, Ikunao Isomura, Ikunao Isomura, Yoshitake Tsuji, Yoshitake Tsuji, Eiji Matsumoto, Eiji Matsumoto, } "Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737929 (11 May 2009); doi: 10.1117/12.824323; https://doi.org/10.1117/12.824323
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