11 May 2009 Optimizing computing resources for optimal throughput in a mask data preparation flow
Author Affiliations +
Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73792Y (2009) https://doi.org/10.1117/12.824349
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
The data volume is increasing exponentially in mask data preparation (MDP) flows for sub-45nm technologies, but time to market drives the acceptable total turnaround time. As a reasonable response, more computing resources are purchased to address these two issues. How to effectively use these resources including the latest CPUs, high-speed networking, and the fastest data storage devices is becoming an urgent problem to solve. A detailed study is conducted in an attempt to find an optimal solution to this problem. In particular, how CPU speed, bandwidth of network connections, and I/O speed of data storage devices affect the total turnaround time (TAT) in a mask data preparation flow is researched. For a given High Performance Computing (HPC) budget and MDP flow TAT constraints, methodologies to optimize HPC resources are proposed.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weidong Zhang, Weidong Zhang, Ron Bennett, Ron Bennett, Pradiptya Ghosh, Pradiptya Ghosh, Steffen Schulze, Steffen Schulze, Amanda Bowhill, Amanda Bowhill, "Optimizing computing resources for optimal throughput in a mask data preparation flow", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73792Y (11 May 2009); doi: 10.1117/12.824349; https://doi.org/10.1117/12.824349
PROCEEDINGS
11 PAGES


SHARE
Back to Top