11 May 2009 Utilization of design intent information for mask manufacturing (II)
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737932 (2009) https://doi.org/10.1117/12.824352
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
The problem of mask cost has been highlighted recently due to the complex manufacturing process as the semiconductor node is getting smaller and smaller. It has been said that DFM methods can be useful for mask cost reduction. One of the ASET/Mask D2I target is the mask data prioritization and its effective uses for mask manufacturing issues from the viewpoints of mask DFM. The Mask D2I and STARC have been working together to build efficient data flow based on the information transition from the design to the manufacturing level. By converting design level information called as "Design Intent" to the priority information of mask manufacturing data called as "Mask Data Rank (MDR)", MDP or manufacturing process based on the importance of reticle patterns is possible. Our main purpose is to build a novel data flow with the priority information of mask patterns extracted from the design intent. In this paper, we introduce a design intent extraction flow which has been newly developed and we show the effectiveness of the fully automated MDR flow with actual chip data. In addition, we show how MDR flow can be applied to analog circuits.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato, Kokoro Kato, Masakazu Endo, Masakazu Endo, Tadao Inoue, Tadao Inoue, Masaki Yamabe, Masaki Yamabe, } "Utilization of design intent information for mask manufacturing (II)", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737932 (11 May 2009); doi: 10.1117/12.824352; https://doi.org/10.1117/12.824352
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