11 May 2009 Organized DFM
Author Affiliations +
Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737934 (2009) https://doi.org/10.1117/12.824354
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
The category and objective of DFM production management are shown. DFM is not limited to an activity within a particular unit process in design and process. A new framework for DFM is required. DFM should be a total solution for the common problems of all processes. Each of them must be linked to one another organically. After passing through the whole of each process on the manufacturing platform, quality of final products is guaranteed and products are shipped to the market. The information platform is layered with DFM, APC, and AEC. Advanced DFM is not DFM for partial optimization of the lithography process and the design, etc. and it should be Organized DFM. They are managed with high-level organizational IQ. The interim quality between each step of the flow should be visualized. DFM will be quality engineering if it is Organized DFM and common metrics of the quality are provided. DFM becomes quality engineering through effective implementation of common industrial metrics and standardized technology. DFM is differential technology, but can leverage standards for efficient development.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Sato, Takashi Sato, Michio Honma, Michio Honma, Hiroyuki Itoh, Hiroyuki Itoh, Nobuyuki Iriki, Nobuyuki Iriki, Sachiko Kobayashi, Sachiko Kobayashi, Norihiko Miyazaki, Norihiko Miyazaki, Toshio Onodera, Toshio Onodera, Hiroyuki Suzuki, Hiroyuki Suzuki, Nobuyuki Yoshioka, Nobuyuki Yoshioka, Sumika Arima, Sumika Arima, Kazuya Kadota, Kazuya Kadota, } "Organized DFM", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737934 (11 May 2009); doi: 10.1117/12.824354; https://doi.org/10.1117/12.824354


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