5 August 2009 Structural properties analysis of CdTe thin films deposited by magnetron sputtering
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Abstract
Different phase structural CdTe films deposited onto 7101 glass substrates by magnetron sputtering were studied as a function of deposition methods at room temperature of 25±1. It was observed that when the deposition power intensity was kept at 0.884w/cm2, and deposition methods were selected among normal method, discrete method and continuous substrate rotation method. Phase structural properties of these films were showed a mix structure of both zinc-blende cubic and wurtzite hexagonal phase, a single structure of cubic phase with the strong (111) preferential orientation, or amorphous CdTe thin films, respectively. Deposition methods played a critical role in determining phase structure of CdTe films.
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Ling-de Kong, Ling-de Kong, Jun Zhao, Jun Zhao, JIn-cheng Kong, JIn-cheng Kong, Yan-li Shi, Yan-li Shi, Rong-bin Ji, Rong-bin Ji, } "Structural properties analysis of CdTe thin films deposited by magnetron sputtering", Proc. SPIE 7383, International Symposium on Photoelectronic Detection and Imaging 2009: Advances in Infrared Imaging and Applications, 738347 (5 August 2009); doi: 10.1117/12.835383; https://doi.org/10.1117/12.835383
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