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17 June 2009 Angle-resolved optical metrology using multi-technique nested uncertainties
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Abstract
This paper introduces recent advances in scatterfield microscopy using improved normalization and fitting procedures. Reduced measurement uncertainties are obtained through the use of more accurate normalization procedures in combination with better parametric fitting algorithms. A new approach to embed atomic force microscopy (AFM) or other reference metrology measurements directly into the uncertainty analysis and library-fitting process is used to reduce parametric uncertainties. We present both simulation results and experimental data demonstrating this new method, which is based on Bayesian analysis as applied to library-based regression. We develop the statistical methods to implement this approach of nested uncertainty analysis and give several examples that demonstrate reduced uncertainties in the final combined measurements. The approach is also demonstrated in a combined reference metrology application using multiple independent measurement methods.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. M. Silver, B. M. Barnes, H. Zhou, N. F. Zhang, and R. Dixson "Angle-resolved optical metrology using multi-technique nested uncertainties", Proc. SPIE 7390, Modeling Aspects in Optical Metrology II, 73900P (17 June 2009); https://doi.org/10.1117/12.827676
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