A study of the image quality in a lossy NFSL

Kwangchil Lee; Kyoungsik Kim

doi:10.1117/12.826796

1 September 2009 A study of the image quality in a lossy NFSL

Kwangchil Lee, Kyoungsik Kim

Proceedings Volume 7392, Metamaterials: Fundamentals and Applications II; 73921E (2009) https://doi.org/10.1117/12.826796
Event: SPIE NanoScience + Engineering, 2009, San Diego, California, United States

Abstract

Recently, the near-field superlens (NFSL) based on the negative permittivity (ε < 0) has been much attraction issue because of its useful application in a near-field imaging system beyond the diffraction limits. Silver in the UV region and silicon carbide in the mid-IR regime has been reported as suitable materials for the NFSL. However, these materials have the intrinsic absorption loss, which blurs the near-field image. In this research, we theoretically predict enhancement of image quality in a lossy NFSL system using the full-wave numerical approach and electrostatic approximation method. As a result, we recognized that an unmatched NFSL has better image quality compared to the traditional match NFSL.

Citation Download Citation

Kwangchil Lee and Kyoungsik Kim "A study of the image quality in a lossy NFSL", Proc. SPIE 7392, Metamaterials: Fundamentals and Applications II, 73921E (1 September 2009); https://doi.org/10.1117/12.826796

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