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2 September 2009 Nanoscale slit arrays as planar far-field lenses
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We report the first experimental demonstration of far-field lensing using a plasmonic slit array. We implement a planar nano-slit lens using a combination of thin film deposition and focused ion beam milling. Our lens structures consist of optically thick gold films with micron-size arrays of closely-spaced, nanoscale slits of varying widths milled using a focused ion beam. We demonstrate experimentally that it acts as a far-field cylindrical lens for light at optical frequencies. We show excellent agreement between the full electromagnetic field simulations of the design, which include both evanescent and propagating modes, and the far-field, diffraction-limited confocal measurements on manufactured structures. The flexibility offered by these slit-based planar lenses allows for the design of microlenses that compensate for oblique illumination in integrated opto-electronic systems, such as complementary metal-oxide semiconductor (CMOS) image sensors.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter B. Catrysse, Lieven Verslegers, Zongfu Yu, Justin S. White, Edward S. Barnard, Mark L. Brongersma, and Shanhui Fan "Nanoscale slit arrays as planar far-field lenses", Proc. SPIE 7394, Plasmonics: Metallic Nanostructures and Their Optical Properties VII, 73940B (2 September 2009);

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