Plasmonic structures fabricated by interference lithography for sensor applications

Jacson W. Menezes; Marcelo Nalin; Enver F. Chillcce; Edmundo S. Braga; Lucila Cescato

doi:10.1117/12.826129

2 September 2009 Plasmonic structures fabricated by interference lithography for sensor applications

Jacson W. Menezes, Marcelo Nalin, Enver F. Chillcce, Edmundo S. Braga, Lucila Cescato

Proceedings Volume 7394, Plasmonics: Metallic Nanostructures and Their Optical Properties VII; 73942M (2009) https://doi.org/10.1117/12.826129
Event: SPIE NanoScience + Engineering, 2009, San Diego, California, United States

Abstract

In this work we demonstrate the use of holographic lithography for generation of large area plasmonic periodic structures. Submicrometric array of holes, with different periods and thickness, were recorded in gold films, in areas of about 1 cm², with homogeneity similar to that of samples recorded by Focused Ion Beam. In order to check the plasmonic properties, we measured the transmission spectra of the samples. The spectra exhibit the typical surface plasmon resonances (SPR) in the infrared whose position and width present the expected behavior with the period of the array and film thickness. The shift of the peak position with the permittivity of the surrounding medium demonstrates the feasebility of the sample as large area sensors.

Citation Download Citation

Jacson W. Menezes, Marcelo Nalin, Enver F. Chillcce, Edmundo S. Braga, and Lucila Cescato "Plasmonic structures fabricated by interference lithography for sensor applications", Proc. SPIE 7394, Plasmonics: Metallic Nanostructures and Their Optical Properties VII, 73942M (2 September 2009); https://doi.org/10.1117/12.826129

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