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2 September 2009 Plasmonic structures fabricated by interference lithography for sensor applications
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Abstract
In this work we demonstrate the use of holographic lithography for generation of large area plasmonic periodic structures. Submicrometric array of holes, with different periods and thickness, were recorded in gold films, in areas of about 1 cm2, with homogeneity similar to that of samples recorded by Focused Ion Beam. In order to check the plasmonic properties, we measured the transmission spectra of the samples. The spectra exhibit the typical surface plasmon resonances (SPR) in the infrared whose position and width present the expected behavior with the period of the array and film thickness. The shift of the peak position with the permittivity of the surrounding medium demonstrates the feasebility of the sample as large area sensors.
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Jacson W. Menezes, Marcelo Nalin, Enver F. Chillcce, Edmundo S. Braga, and Lucila Cescato "Plasmonic structures fabricated by interference lithography for sensor applications", Proc. SPIE 7394, Plasmonics: Metallic Nanostructures and Their Optical Properties VII, 73942M (2 September 2009); https://doi.org/10.1117/12.826129
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