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20 August 2009 Effects of oxygen on structural, morphological, and optical properties of sputtered ZnO films on glass substrate
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Abstract
The structural, morphological and optical properties of zinc oxide (ZnO) thin films were investigated. The ZnO thin films were deposited on glass substrate at room temperature (RT) through radio frequency magnetron sputtering in different O2 flux (fixed Ar flux). The structural properties and morphology were studied by X-ray diffraction and atomic force microscopy, respectively. The highly crystallized ZnO thin films were obtained. It is found that all the films have preferential orientation in c-axis direction and the crystallinity of the films is strongly affected by O2 flux. The crystallinity is improved greatly when the film is annealed in O2 ambient. Atomic force microscopy results show that the films are compact and smooth. Near band edge emission peak in photoluminescence spectrum for the typical sample appears red-shift phenomena. All the films present a high transmittance of above 90% in the visible region.
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Y. P. Liao, Sh. X. Li, J. H. Zhang, H. Zhang, X. F. Li, and Z. S. Guo "Effects of oxygen on structural, morphological, and optical properties of sputtered ZnO films on glass substrate", Proc. SPIE 7404, Nanostructured Thin Films II, 74040D (20 August 2009); https://doi.org/10.1117/12.824513
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