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20 August 2009 Use of multiple DC magnetron deposition sources for uniform coating of large areas
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Abstract
Uniform coating of large areas is a technically challenging aspect of physical vapor deposition. This investigation shows that good film uniformity across large areas can be repetitively achieved by a DC magnetron sputtering process by use of multiple sources. A unique feature of this technique is the ability to predict and control the film distribution using the deposition rate, adding flexibility to the deposition system. A model for predicting the material distribution from multiple sources is presented. It will also be demonstrated that this process yields efficient use of the vapor generated from the sources, which results in higher deposition rates and less system maintenance.
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David W. Reicher, Roberto Christian, Patrick Davidson, and Stanley Z. Peplinski "Use of multiple DC magnetron deposition sources for uniform coating of large areas", Proc. SPIE 7409, Thin Film Solar Technology, 740909 (20 August 2009); https://doi.org/10.1117/12.824882
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