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20 August 2009 High-speed growth of pentacene thin films by in-line organic vapor phase deposition
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Abstract
Taking another step towards industrial production of devices based on organic semi-conductors, this work presents an extension of the organic vapor phase deposition technique to in-line geometry. A study of the in-line tool operation is carried out. It leads to the definition of a specific in-line deposition rate that qualifies the coating speed. It also allows for an understanding of processing parameter variations that lead to high deposition speeds. As a consequence, pentacene films are grown at in-line deposition rates of up to 1055μm2/s. This corresponds to web speeds of 2.1 m/min, equivalent to an average deposition rate of 105 Å/s in a static system. These films present a high uniformity, with a thickness standard deviation below 1.2% over 4 inch diameter substrates. Moreover, with transistor mobilities of up to 1.5 cm2/Vs, these pentacene films are of excellent electrical quality. This quality is conserved up to the highest deposition rates. Finally, 5-stage ring oscillators on foil based on a pentacene thin film deposited by in-line OVPD achieve a frequency of 24 kHz at a supply voltage of 20 V.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cédric Rolin, Karolien Vasseur, Soeren Steudel, Peter Vicca, Jan Genoe, and Paul Heremans "High-speed growth of pentacene thin films by in-line organic vapor phase deposition", Proc. SPIE 7417, Organic Field-Effect Transistors VIII, 741712 (20 August 2009); https://doi.org/10.1117/12.825913
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