4 September 2009 Design and development of nanostructure based antireflection coatings for EO/IR sensor applications
Author Affiliations +
Abstract
EO/IR Nanosensors are being developed for a variety of Defense and Commercial Systems Applications. These include UV, Visible, NIR, MWIR and LWIR Nanotechnology based Sensors. The conventional SWIR Sensors use InGaAs based IR Focal Plane Array (FPA) that operate in 1.0-1.8 micron region. Similarly, MWIR Sensors use InSb or HgCdTe based FPA that is sensitive in 3-5 micron region. More recently, there is effort underway to evaluate low cost SiGe visible and near infrared band that covers performance up to 1.6 micron. The use of Nanowires for developing high quality antireflection coatings that allows minimizing the reflection loss is discussed. We have explored the possibility of using nanostructures grown by oblique angle deposition technique. A graded-index coating with different index profiles has been investigated for broadband antireflection properties, particularly with air as the ambient medium. In this paper, we present, modeling and experimental results for nanostructure AR coatings for UV, Visible and calculations for NIR sensors and also their utility for longer wavelength application.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ashok K. Sood, Roger E. Welser, Yash R. Puri, Martin F. Schubert, David J. Poxson, Jong Kyu Kim, E. Fred Schubert, Dennis L. Polla, Martin B. Soprano, "Design and development of nanostructure based antireflection coatings for EO/IR sensor applications", Proc. SPIE 7419, Infrared Systems and Photoelectronic Technology IV, 74190U (4 September 2009); doi: 10.1117/12.829899; https://doi.org/10.1117/12.829899
PROCEEDINGS
8 PAGES


SHARE
Back to Top