21 August 2009 Fabrication of 300-mm silicon reference wafer by using direct laser writer
Author Affiliations +
Abstract
We propose a new method based on direct laser writing to fabricate reference chromium patterns on a silicon wafer. Our method is able to fabricate a maximum 360-mm-diameter pattern with 651-nm position uncertainty. The minimum pattern size is about 0.8 μm (line width value) and the maximum available height of the pattern is slightly over 400 nm.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hyug-Gyo Rhee, Dong-Ik Kim, Seung-Ki Hong, Jae-Bong Song, Yun-Woo Lee, "Fabrication of 300-mm silicon reference wafer by using direct laser writer", Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 742612 (21 August 2009); doi: 10.1117/12.824846; https://doi.org/10.1117/12.824846
PROCEEDINGS
4 PAGES


SHARE
Back to Top