10 September 2009 Three-dimensional profilometry system incorporating a MEMS scanner
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Abstract
To improve difficulties inherent to the conventional three-dimensional profiling system based on pattern projection method, we propose incorporating a recent digital device such as a MEMS scanner into projection optics. Due to this revision, first of all, a compact measurement system is easily attainable, and, when we adjust the scanner to produce the original pattern with non-equal periodical structure, the projected pattern is so formed as to be equal in period on the reference plane. In addition, the pattern becomes sharp over the whole field of measurement when the Scheimpflug condition is satisfied in optical arrangement. This brings easier analysis of the captured pattern and attains the threedimensional profilometry system with deeper range of focus, wider field of measurement and higher accuracy of measurement.
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Toru Yoshizawa, Toshitaka Wakayama, "Three-dimensional profilometry system incorporating a MEMS scanner", Proc. SPIE 7432, Optical Inspection and Metrology for Non-Optics Industries, 74320P (10 September 2009); doi: 10.1117/12.825980; https://doi.org/10.1117/12.825980
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