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31 August 2009 Silicon pore optics development
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Abstract
Future X-ray astrophysics missions, such as the International X-ray Observatory, IXO, require the development of novel optics in order to deliver the mission's large aperture, high angular resolution and low mass requirements. A series of activities have been pursued by ESA, leading a consortium of European industries to develop Silicon Pore Optics for use as an x-ray mirror technology. A novel process takes as the base mirror material commercially available silicon wafers, which have been shown to possess excellent x-ray reflecting qualities. These are ribbed, curved and stacked concentrically in layers that have the desired shape at a given radii of the x-ray aperture. Pairs of stacks are aligned and mounted into doubly reflecting mirror modules that can be aligned into the x-ray aperture without the very high angular and position alignment requirements that need to be achieved for mirror plates within the mirror module. The use of this silicon pore optics design substantially reduces mirror assembly time, equipment and costs in comparison to alternative IXO mirror designs. This paper will report the current technology development status of the silicon pore optics and the roadmap expected for developments to meet an IXO schedule. Test results from measurements performed at the PTB lab of the Bessy synchrotron facility and from full illumination at the Panter x-ray facility will be presented.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kotska Wallace, Marcos Bavdaz, Philippe Gondoin, Maximilien J. Collon, Ramses Günther, Marcelo Ackermann, Marco W. Beijersbergen, Mark Olde Riekerink, Marko Blom, Bob Lansdorp, and Lennart de Vreede "Silicon pore optics development", Proc. SPIE 7437, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV, 74370T (31 August 2009); https://doi.org/10.1117/12.825824
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