28 September 2009 Advances in full field microscopy with table-top soft x-ray lasers
Author Affiliations +
We describe recent advances in the demonstration of table-top full field microscopes that use soft x-ray lasers for illumination. We have achieved wavelength resolution and single shot exposure operation with a very compact 46.9 nm microscope based on a desk-top size capillary discharge laser. This λ=46.9 nm microscope has been used to captured full field images of a variety of nanostructure systems and surfaces. In a separate development we have demonstrated a zone plate microscope that uses λ=13.2 nm laser illumination to image absorption defects in a extreme ultraviolet lithography (EUVL) mask in the same geometry used in a 4x demagnification EUVL stepper. Characterization of the microscope's transfer function shows it can resolve 55 nm half period patterns. With these capabilities, the λ=13.2 nm microscope is well suited for evaluation of pattern and defect printability of EUVL masks for the 22 nm node.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carmen S. Menoni, Carmen S. Menoni, Fernando Brizuela, Fernando Brizuela, Yong Wang, Yong Wang, Courtney A. Brewer, Courtney A. Brewer, Bradley M. Luther, Bradley M. Luther, Francesco Pedaci, Francesco Pedaci, Przemeslaw W. Wachulak, Przemeslaw W. Wachulak, Mario C. Marconi, Mario C. Marconi, Jorge J. Rocca, Jorge J. Rocca, Weilun Chao, Weilun Chao, Erik H. Anderson, Erik H. Anderson, Yanwei Liu, Yanwei Liu, Kenneth A. Goldberg, Kenneth A. Goldberg, David T. Attwood, David T. Attwood, Alexander V. Vinogradov, Alexander V. Vinogradov, Igor A. Artyukov, Igor A. Artyukov, Yuri P. Pershyn, Yuri P. Pershyn, Viktor Kondratenko, Viktor Kondratenko, } "Advances in full field microscopy with table-top soft x-ray lasers", Proc. SPIE 7451, Soft X-Ray Lasers and Applications VIII, 74510I (28 September 2009); doi: 10.1117/12.826419; https://doi.org/10.1117/12.826419

Back to Top