PROCEEDINGS VOLUME 7470
25TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | 12-15 JANUARY 2009
25th European Mask and Lithography Conference
Editor(s): Uwe F. W. Behringer
IN THIS VOLUME

13 Sessions, 43 Papers, 0 Presentations
Front Matter  (1)
EUV I  (4)
NIL  (4)
Metrology  (4)
ML2  (4)
EUV II  (3)
25TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE
12-15 January 2009
Dresden, Germany
Front Matter
Proc. SPIE 7470, Front Matter: Vol. 7470, 747001 (12 June 2009); doi: 10.1117/12.834189
Plenary Session I
Proc. SPIE 7470, Lithography development and research challenges for the ≤22nm half-pitch, 747002 (23 May 2009); doi: 10.1117/12.834186
Proc. SPIE 7470, Mask industry assessment trend analysis, 747003 (27 May 2009); doi: 10.1117/12.835157
Plenary Session II
Proc. SPIE 7470, Mask salvage in the age of capital contraction, 747004 (27 May 2009); doi: 10.1117/12.835795
Mask Business and Application
Proc. SPIE 7470, SEMATECH mask program, 747005 (27 May 2009); doi: 10.1117/12.835796
Proc. SPIE 7470, Mask parameter variation in the context of the overall variation budget of an advanced logic wafer Fab, 747006 (27 May 2009); doi: 10.1117/12.835166
Simulation and Double Patterning
Proc. SPIE 7470, Extended Abbe approach for fast and accurate lithography imaging simulations, 747007 (27 May 2009); doi: 10.1117/12.835168
Proc. SPIE 7470, Decomposition algorithm for double patterning of contacts and via layers, 747008 (27 May 2009); doi: 10.1117/12.835169
Proc. SPIE 7470, Mask contribution on CD and OVL errors budgets for double patterning lithography, 747009 (27 May 2009); doi: 10.1117/12.835171
Mask Cleaning/Haze
Proc. SPIE 7470, New methods and processes based on advanced vacuum technology for photomask decontamination, 74700A (27 May 2009); doi: 10.1117/12.835172
Proc. SPIE 7470, Particle transport and reattachment on a mask surface, 74700B (27 May 2009); doi: 10.1117/12.835173
Proc. SPIE 7470, Contamination control for ArF photo masks, 74700C (27 May 2009); doi: 10.1117/12.835174