27 May 2009 Mask industry assessment trend analysis
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Proceedings Volume 7470, 25th European Mask and Lithography Conference; 747003 (2009) https://doi.org/10.1117/12.835157
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany
Abstract
Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH to gather information about the mask industry as an objective assessment of its overall condition. This year's survey data were presented in detail at BACUS and the detailed trend analysis presented at EMLC. The survey is designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the seventh in the current series of annual reports. With continued industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments on critical path issues. This year's survey is basically the same as the surveys in 2005 through 2007. Questions are grouped into seven categories: General Business Profile Information, Data Processing, Yields and Yield Loss, Mechanisms, Delivery Times, Returns, and Services. (Examples are given below). Within each category is a multitude of questions that creates a detailed profile of both the business and technical status of the critical mask industry.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Greg Hughes, Greg Hughes, Henry Yun, Henry Yun, } "Mask industry assessment trend analysis", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 747003 (27 May 2009); doi: 10.1117/12.835157; https://doi.org/10.1117/12.835157
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