Residual-free imprint for sensor definition

A. Mayer; N. Bogdanski; S. Möllenbeck; H.-C. Scheer

doi:10.1117/12.835182

27 May 2009 Residual-free imprint for sensor definition

A. Mayer, N. Bogdanski, S. Möllenbeck, H.-C. Scheer

Author Affiliations +

Proceedings Volume 7470, 25th European Mask and Lithography Conference; 74700K (2009) https://doi.org/10.1117/12.835182
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany

Abstract

For the preparation of interdigitated sensor devices with nanometre sized electrodes a low-cost route is followed. The central technique used for electrode definition is nanoimprint. To imprint the larger contact areas as easy as the electrodes, the contacts are broken down into a grid. In order to end up with a highly uniform residual layer the concept of 'partial cavity filling' is utilised, resulting in an almost negligible layer thickness. The metallic electrodes are defined by sputtering and lift-off directly after imprint, where a previous etching of the residual layer is not required. The results show that the concept works. With this strategy, preparation of an interdigitated sensor requires nothing but spin-coating, nanoimprinting and sputtering/lift-off.

Citation Download Citation

A. Mayer, N. Bogdanski, S. Möllenbeck, and H.-C. Scheer "Residual-free imprint for sensor definition", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 74700K (27 May 2009); https://doi.org/10.1117/12.835182

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