27 May 2009 Innovative processes investigation for photomask pod conditioning and drying
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Proceedings Volume 7470, 25th European Mask and Lithography Conference; 747010 (2009) https://doi.org/10.1117/12.835198
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany
Abstract
Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithography. It is therefore essential to measure, to understand and then try to reduce AMC in mask environment. Results and assessment of mask pod environment in term of molecular contamination was presented in a first step (11). Then in second step further studies was carried out within European CRYSTAL project in order to reduce mask pod influence and contamination due to material out gassing. Results are shown here. These studies were carried out in the frame of the European R&D project, the so called "CRYSTAL" project, focusing on photomask defect reduction.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. M. Foray, C. Rude, J. Palisson, M. Davenet, A. Favre, D. Cheung, F. Dufaye, S. Gough, P. Richteiger, V. Baudiquez, E. Foca, P. Nesladek, S. Gopalakrishnan, K. Avary, I. Höllein, "Innovative processes investigation for photomask pod conditioning and drying", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 747010 (27 May 2009); doi: 10.1117/12.835198; https://doi.org/10.1117/12.835198
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