23 September 2009 Printability verification function of mask inspection system
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Abstract
In addition to the conventional demands for high sensitivities with which the mask inspection system detects the minute size defects, capability to extract true defects from a wide variety of patterns that should not be counted as pseudo defects has been quite demanding. It is necessary to ascertain suppression of MEEF incurred by the combination of parameters such as LER and defects of SRAF. NFT and Brion are jointly developing a mask-image based printability verification system with functions combining their respective technologies with the results from ASET's research. This report describes such defect detection results and introduces the development of a mask inspection system with printability verification function.
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Hideo Tsuchiya, Hideo Tsuchiya, Masaki Yamabe, Masaki Yamabe, Masakazu Tokita, Masakazu Tokita, Kenichi Takahara, Kenichi Takahara, Kinya Usuda, Kinya Usuda, Fumio Ozaki, Fumio Ozaki, Nobutaka Kikuiri, Nobutaka Kikuiri, } "Printability verification function of mask inspection system", Proc. SPIE 7488, Photomask Technology 2009, 74880B (23 September 2009); doi: 10.1117/12.829739; https://doi.org/10.1117/12.829739
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