Model-based assist features

Bayram Yenikaya; Oleg Alexandrov; Yongjun Kwon; Anwei Liu; Ali Mokhberi; Apo Sezginer

doi:10.1117/12.829938

23 September 2009 Model-based assist features

Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer

Author Affiliations +

Proceedings Volume 7488, Photomask Technology 2009; 748815 (2009) https://doi.org/10.1117/12.829938
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

In a recent paper15, we presented a novel method for fully automated model-based generation and optimization of sub-resolution assist features which, when placed on a contact layer photomask, minimize the variations in the printed pattern with respect to focus change. Here we extend that methodology to improve the contrast of the light intensity in addition to minimizing variations caused by focus change.

Citation Download Citation

Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, and Apo Sezginer "Model-based assist features", Proc. SPIE 7488, Photomask Technology 2009, 748815 (23 September 2009); https://doi.org/10.1117/12.829938

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE