23 September 2009 Model-based assist features
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Abstract
In a recent paper15, we presented a novel method for fully automated model-based generation and optimization of sub-resolution assist features which, when placed on a contact layer photomask, minimize the variations in the printed pattern with respect to focus change. Here we extend that methodology to improve the contrast of the light intensity in addition to minimizing variations caused by focus change.
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Bayram Yenikaya, Oleg Alexandrov, Yongjun Kwon, Anwei Liu, Ali Mokhberi, Apo Sezginer, "Model-based assist features", Proc. SPIE 7488, Photomask Technology 2009, 748815 (23 September 2009); doi: 10.1117/12.829938; https://doi.org/10.1117/12.829938
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