23 September 2009 Model-based assist features
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In a recent paper15, we presented a novel method for fully automated model-based generation and optimization of sub-resolution assist features which, when placed on a contact layer photomask, minimize the variations in the printed pattern with respect to focus change. Here we extend that methodology to improve the contrast of the light intensity in addition to minimizing variations caused by focus change.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bayram Yenikaya, Bayram Yenikaya, Oleg Alexandrov, Oleg Alexandrov, Yongjun Kwon, Yongjun Kwon, Anwei Liu, Anwei Liu, Ali Mokhberi, Ali Mokhberi, Apo Sezginer, Apo Sezginer, } "Model-based assist features", Proc. SPIE 7488, Photomask Technology 2009, 748815 (23 September 2009); doi: 10.1117/12.829938; https://doi.org/10.1117/12.829938

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