23 September 2009 Optical metrology for template and disk patterned imprints
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Abstract
Driven by the ever-growing storage density needs, the hard-disk drive (HDD) industry is transitioning to patterned magnetic media. For the first time, magnetic media disk production will require advanced lithography and critical dimension (CD) process control. The CDs of patterned media features will have to be smaller than the most advanced semiconductor design rules, and nano-imprint lithography (NIL) is the only candidate to yield such small dimensions at the low cost the industry demands. After an introduction to the industry's drivers for the transition, we give a summary of the NIL process for HDD media production, and an estimate of the CD metrology requirements for future process control. We then present some arguments and results to illustrate how a spectroscopic ellipsometry based scatterometry technique could be a good candidate to meet the CD control requirements of the patterned media roadmap. Simulations and experimental results on several DTM structures, for both template and disk imprints are discussed.
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Roman Sappey, Roman Sappey, Art Jenkins, Art Jenkins, Sri Venkataram, Sri Venkataram, } "Optical metrology for template and disk patterned imprints", Proc. SPIE 7488, Photomask Technology 2009, 74881X (23 September 2009); doi: 10.1117/12.833285; https://doi.org/10.1117/12.833285
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