Back-glass cleaning: reducing repelliclization costs by focused action

Francesca Perissinotti; Luca Sartelli; Hiroyuki Miyashita; Ming-Chien Chiu; Yu-Chang Liu; Hung-Chieh Chung; Frank Sundermann; Stuart Gough; Sonia Tourniol; Felix Dufaye

doi:10.1117/12.830718

23 September 2009 Back-glass cleaning: reducing repelliclization costs by focused action

Francesca Perissinotti, Luca Sartelli, Hiroyuki Miyashita, Ming-Chien Chiu, Yu-Chang Liu, Hung-Chieh Chung, Frank Sundermann, Stuart Gough, Sonia Tourniol, Felix Dufaye

Author Affiliations +

Proceedings Volume 7488, Photomask Technology 2009; 74882M (2009) https://doi.org/10.1117/12.830718
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

With the optimization of sulfate-free cleaning the issue of haze under pellicle was almost eliminated. In consequence, current reasons for mask repelliclization needs are moving from pattern issues to more gross problems on back glass. Moreover, the longer life of photomasks allows a new problem to appear as growing defects on back glass, commonly ascribed to environmental conditions at user's site. The commonality of these problems is being independent on mask complexity and substrate. In order to avoid the criticalities of pellicle removal and cleaning treatment as well as the cost of necessary inspection after new pellicle application, the best solution is cleaning only the backside of the mask, provided that integrity of pellicle and pattern on front side are preserved In this article we present the results obtained by the use of the Mask cleaner DE050019^TM on several cases. The efficiency of the treatment was assessed in terms if removal capability on different kinds of contaminations, either from use or mask aging. Pattern inspections were conducted in order to assess ESD robustness. Ionic residues were checked by IC aimed to compare with standard cleanings. This methodology demonstrated to be capable of maintaining a Particle Removal Efficiency>97% on all kinds of contaminations, without any damage to pellicle or harm to patterns, still maintaining residual ions at the same level as after cleaning by standard tools.

Citation Download Citation

Francesca Perissinotti, Luca Sartelli, Hiroyuki Miyashita, Ming-Chien Chiu, Yu-Chang Liu, Hung-Chieh Chung, Frank Sundermann, Stuart Gough, Sonia Tourniol, and Felix Dufaye "Back-glass cleaning: reducing repelliclization costs by focused action", Proc. SPIE 7488, Photomask Technology 2009, 74882M (23 September 2009); https://doi.org/10.1117/12.830718

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available