29 September 2009 Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics
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Abstract
A novel EUV mask inspection tool with 199nm laser source and super-resolution technique has been developed. This tool is based on NPI-5000PLUS, which is a photo-mask inspection tool for hp2X nm node and beyond. In order to implement EUV mask inspection with only a short time for mask set-up, reflected illumination type alignment optics to guide alignment mark and adjust mask coordinate with visible illumination light are equipped. Moreover, to inspect EUV masks for hp2X nm and beyond, the image detection optics with the novel polarized illumination technique is incorporated in this tool. Image contrast enhancement was confirmed by experiments and simulations.
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Nobutaka Kikuiri, Nobutaka Kikuiri, Masatoshi Hirono, Masatoshi Hirono, Ryoichi Hirano, Ryoichi Hirano, Tsuyoshi Amano, Tsuyoshi Amano, Osamu Suga, Osamu Suga, Hiroyuki Shigemura, Hiroyuki Shigemura, Hideaki Hashimoto, Hideaki Hashimoto, Kenichi Takahara, Kenichi Takahara, Kinya Usuda, Kinya Usuda, } "Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics", Proc. SPIE 7488, Photomask Technology 2009, 74882O (29 September 2009); doi: 10.1117/12.829747; https://doi.org/10.1117/12.829747
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