Improving the quality of fractured mask data through in-place optimization of the fracturing solution

D. S. S. Bhardwaj; Nageswara Rao; Archana Rajagopalan; Nitin P. Bhat; Ravi R. Pai

doi:10.1117/12.829628

23 September 2009 Improving the quality of fractured mask data through in-place optimization of the fracturing solution

D. S. S. Bhardwaj, Nageswara Rao, Archana Rajagopalan, Nitin P. Bhat, Ravi R. Pai

Proceedings Volume 7488, Photomask Technology 2009; 74882X (2009) https://doi.org/10.1117/12.829628
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

In this paper, we present the idea of (in-place) substitution of the fracture solution for some of the badly or nonuniformly fractured instances of polygons, by a better fracture solution. Polygons could be categorized as badly or nonuniformly fractured based on the values of various quality metrics - such as number of generated trapezoids, number of slivers, uniformity in fracturing etc. The inferior quality of fracture solution may be due to sub-optimal fracturing. This In-Place Optimization (IPO) strategy proposes a solution wherein rather than carrying out a complete re-fracturing of the mask data, the QoR of fractured data can be improved "in-place" through applying patches to the hotspots of badly or non-uniformly fractured polygons. The proposed IPO scheme is flexible enough to classify the QoR of a fractured solution of a polygon using externally defined parameters or formulae. In a way, the users responsible for mask MDP can categorize the quality of a fractured solution as good or bad through defining some criteria externally to the tool. The IPO scheme allows internal substitution, where a better fracture solution for any given polygon is found within the same fracture data at some other instance of the polygon, or external substitution where a better fracturing solution is generated using a third party fracturing tool or by using the same fracturing tool with different inputs. Since this IPO technique modifies the fractured mask data, it is mandatory to have a built-in validation scheme which is discussed in detail.

Citation Download Citation

D. S. S. Bhardwaj, Nageswara Rao, Archana Rajagopalan, Nitin P. Bhat, and Ravi R. Pai "Improving the quality of fractured mask data through in-place optimization of the fracturing solution", Proc. SPIE 7488, Photomask Technology 2009, 74882X (23 September 2009); https://doi.org/10.1117/12.829628

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KEYWORDS

Photomasks

Vestigial sideband modulation

Algorithm development

Prototyping

Software development

Current controlled current source

Electronic design automation

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