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23 September 2009 Improving the quality of fractured mask data through in-place optimization of the fracturing solution
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Abstract
In this paper, we present the idea of (in-place) substitution of the fracture solution for some of the badly or nonuniformly fractured instances of polygons, by a better fracture solution. Polygons could be categorized as badly or nonuniformly fractured based on the values of various quality metrics - such as number of generated trapezoids, number of slivers, uniformity in fracturing etc. The inferior quality of fracture solution may be due to sub-optimal fracturing. This In-Place Optimization (IPO) strategy proposes a solution wherein rather than carrying out a complete re-fracturing of the mask data, the QoR of fractured data can be improved "in-place" through applying patches to the hotspots of badly or non-uniformly fractured polygons. The proposed IPO scheme is flexible enough to classify the QoR of a fractured solution of a polygon using externally defined parameters or formulae. In a way, the users responsible for mask MDP can categorize the quality of a fractured solution as good or bad through defining some criteria externally to the tool. The IPO scheme allows internal substitution, where a better fracture solution for any given polygon is found within the same fracture data at some other instance of the polygon, or external substitution where a better fracturing solution is generated using a third party fracturing tool or by using the same fracturing tool with different inputs. Since this IPO technique modifies the fractured mask data, it is mandatory to have a built-in validation scheme which is discussed in detail.
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D. S. S. Bhardwaj, Nageswara Rao, Archana Rajagopalan, Nitin P. Bhat, and Ravi R. Pai "Improving the quality of fractured mask data through in-place optimization of the fracturing solution", Proc. SPIE 7488, Photomask Technology 2009, 74882X (23 September 2009); doi: 10.1117/12.829628; https://doi.org/10.1117/12.829628
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