Paper
23 September 2009 What is a good empirical model?
Eldar Khaliullin, Yaogang Lian, Mark Davey, Xin Zhou
Author Affiliations +
Abstract
An accurately predictive process model is of utmost importance to the traditional Optical Proximity Correction (OPC), the leading-edge Inverse Lithography Technology (ILT), or other simulation software for IC manufacturing. There are many parameters and methods in constructing and calibrating a model. But it is difficult to obtain a good empirical model, partly because the assessment of the final result is lacking in terms of quantitative and objective metrics. We set out to define certain practical guidelines, e.g. Model Effectiveness Standard Index (MESI), for analyzing parameter uncertainty and estimating simulation uncertainty of an empirical model, so that we know what to choose among many similar candidates. The discussion is framed in the estimation theory of statistics.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eldar Khaliullin, Yaogang Lian, Mark Davey, and Xin Zhou "What is a good empirical model?", Proc. SPIE 7488, Photomask Technology 2009, 74883P (23 September 2009); https://doi.org/10.1117/12.829731
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Cited by 2 scholarly publications.
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KEYWORDS
Data modeling

Calibration

Process modeling

Lithography

Cadmium sulfide

Estimation theory

Optical proximity correction

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