5 October 2009 Align-and-shine photolithography
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Proceedings Volume 7503, 20th International Conference on Optical Fibre Sensors; 75036Q (2009) https://doi.org/10.1117/12.834240
Event: 20th International Conference on Optical Fibre Sensors, 2009, Edinburgh, United Kingdom
At the beginning of 2009, our group has introduced a new technique that allows fabrication of photolithographic patterns on the cleaved end of an optical fibre: the align-and-shine photolithography technique (see A. Petrušis et al., "The align-and-shine technique for series production of photolithography patterns on optical fibres", J. Micromech. Microeng. 19, 047001, 2009). Align-and-shine photolithography combines standard optical lithography with imagebased active fibre alignment processes. The technique adapts well to series production, opening the way to batch fabrication of fibre-top devices (D. Iannuzzi et al., "Monolithic fibre-top cantilever for critical environments and standard applications", Appl. Phys. Lett. 88, 053501, 2006) and all other devices that rely on suitable machining of engineered parts on the tip of a fibre. In this paper we review our results and briefly discuss its potential applications.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Audrius Petrusis, Audrius Petrusis, Jan H. Rector, Jan H. Rector, Kristen Smith, Kristen Smith, Sven de Man, Sven de Man, Davide Iannuzzi, Davide Iannuzzi, "Align-and-shine photolithography", Proc. SPIE 7503, 20th International Conference on Optical Fibre Sensors, 75036Q (5 October 2009); doi: 10.1117/12.834240; https://doi.org/10.1117/12.834240


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