Studies of femtosecond laser induced damage of HfO2 thin film in atmospheric and vacuum environments

D. N. Nguyen; L. A. Emmert; W. Rudolph; D. Patel; E. Krous; C. S. Menoni; M. Shinn

doi:10.1117/12.836505

31 December 2009 Studies of femtosecond laser induced damage of HfO₂ thin film in atmospheric and vacuum environments

D. N. Nguyen, L. A. Emmert, W. Rudolph, D. Patel, E. Krous, C. S. Menoni, M. Shinn

Proceedings Volume 7504, Laser-Induced Damage in Optical Materials: 2009; 750403 (2009) https://doi.org/10.1117/12.836505
Event: Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, 2009, Boulder, Colorado, United States

Abstract

The single pulse femtosecond laser induced damage threshold (LIDT) of hafnia and silica films is not affected by the ambient gas pressure. In vacuum, the multiple pulse LIDT drops to ~10% (~10%) of its atmospheric value for hafnia (silica). The water vapor content of the ambient gas was found to control the change in the LIDT. The LIDT of bulk fused silica surfaces did now show any dependence on the ambient gas pressure. Hydrocarbons (toluene) did not change the multiple pulse LIDT for Hafnia films

Citation Download Citation

D. N. Nguyen, L. A. Emmert, W. Rudolph, D. Patel, E. Krous, C. S. Menoni, and M. Shinn "Studies of femtosecond laser induced damage of HfO₂ thin film in atmospheric and vacuum environments", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750403 (31 December 2009); https://doi.org/10.1117/12.836505

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