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31 December 2009 Laser conditioning of high reflectivity mirrors used in OPOs by 266 and 355 nm nanosecond pulses
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Abstract
Experimental investigation of the laser conditioning efficiency by nanosecond pulses at 266 and 355 nm in high reflectivity mirrors used in optical parametric oscillators (OPOs) is present in this report. The high reflection coatings were deposited on the fused silica substrates. The materials used for e-beam coating deposition were ZrO2 and SiO2. Laser conditioning was investigated as function of number of pulses, wavelength and conditioning protocol. Ramped-fluence pre-exposure was used as a method to explore optimal improvement to the damage performance at 266 and 355 nm. No conditioning effect was observed using nanosecond pulses at 266 nm, but the mirror conditioning with 355 nm pulses increased the laser-induced damage threshold (LIDT) by 2.5-3 times. The experimental results support the concept that the laser conditioning effect observed in high quality optical thin films is associated with intrinsic electronic defects in the films.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrius Melninkaitis, Arturas Vaninas, Julius Mirauskas, Kestutis Kuršelis, Ona Balachninaite, and Valdas Sirutkaitis "Laser conditioning of high reflectivity mirrors used in OPOs by 266 and 355 nm nanosecond pulses", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750408 (31 December 2009); https://doi.org/10.1117/12.836496
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