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31 December 2009 Influence of subsurface defects on 355 nm laser damage resistance of monolayer and multilayer coatings
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In this study, fused silica substrates were etched to different depths, ranging from about 200 nm to 600 nm. And then single-layer, anti-reflection (AR) and high reflection (HR) coatings were deposited to the etched substrates using E-beam evaporation. It was found that 355nm laser induced damage thresholds (LIDTs) of single-layer and AR coatings on the etched substrates were much higher than that on un-etched substrates, and the existing of the top 200 nm of the substrate was the most important factor influencing the damage behaviors of single-layer and AR coatings. Step Profiler was employed in measuring the depth of damage sites in the coatings deposited on the un-etched substrates. It showed that laser damage was initiated from the coating-substrate interface for single-layer and AR coatings, while from the inside of coating stack for HR samples. On the basis of above results, we concluded that subsurface defects in the redeposition layer of substrate could be a serious factor that lowered the 355nm LIDTs of single-layer and AR coatings.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guohang Hu, Shuying Shao, Minghong Yang, Jianda Shao, Yuanan Zhao, Kui Yi, and Zhengxiu Fan "Influence of subsurface defects on 355 nm laser damage resistance of monolayer and multilayer coatings", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040D (31 December 2009);

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