Analysis of optical field distribution of the super-Gaussian beam passing through continuous phase plate

Hao Yan; Chunlin Yang; Shenglin Wen; Jing Hou

doi:10.1117/12.837916

30 November 2009 Analysis of optical field distribution of the super-Gaussian beam passing through continuous phase plate

Hao Yan, Chunlin Yang, Shenglin Wen, Jing Hou

Author Affiliations +

Proceedings Volume 7506, 2009 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 75062L (2009) https://doi.org/10.1117/12.837916
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

The design and manufacure of Continuous Phase Plate(CPP) with a large aperture is very significant and useful to the Inertial Confinement Fusion(ICF) and some physical experiment related due to its several advantages such as high energy availability ratio and easily controllable focal spot's profile. Various processing errors will be inevitably introduced for the limitation of the fabrication technique and hence produce aberrated laser wavefront, which is very influential for the process of beam's propagation and focusing. In this paper we numerically simulate and compare the optical filed distributions of phase-aberrated super-Gaussian beam passing through both designed and manufactured CPP with a large aperture and deep phase. The simulation results prove the CPP's beam smoothing performance and high tolerance of the super-Gaussian beam's far-field focal plane intensity distributions,which has been added by the random phase screen, furthermore, the modulation influence of intermediate frequency phase error to the near-field light intensity distribution has also been simulated and proved, from which we can improve the fabrication technique and optimize the design method.

Citation Download Citation

Hao Yan, Chunlin Yang, Shenglin Wen, and Jing Hou "Analysis of optical field distribution of the super-Gaussian beam passing through continuous phase plate", Proc. SPIE 7506, 2009 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 75062L (30 November 2009); https://doi.org/10.1117/12.837916

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