20 November 2009 On-line measurement of profile parameters of rectangular holographic photoresist gratings during development
Author Affiliations +
Abstract
This paper presents a method for on-line measuring photoresist grating profiles during the development process by detecting the diffraction efficiencies of surface-relief photoresist gratings on transparent substrates. A He-Ne laser of 594.1 nm wavelength is employed as the monitoring light source. Firstly, the groove depth of a grating is determined from the minimum value of the monitoring curve of the 0th-order transmission intensity. Then, with the groove depth known, the duty cycle of the grating is measured from the -1st-order transmission intensity. The feasibility of our method has been demonstrated through fabrication of many rectangular photoresist gratings of 1200, 2200, and 3000 lines/mm on glass substrates. Good agreement between the on-line, real-time measured results and the scanning electron microscopy results is obtained.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shiming Wei, Shiming Wei, Lifeng Li, Lifeng Li, "On-line measurement of profile parameters of rectangular holographic photoresist gratings during development", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75110J (20 November 2009); doi: 10.1117/12.837778; https://doi.org/10.1117/12.837778
PROCEEDINGS
9 PAGES


SHARE
Back to Top