25 November 2009 Investigations on titanium oxide film as an alternative heat sensitive material
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Proceedings Volume 7513, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Process Technology; 751315 (2009); doi: 10.1117/12.837590
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China
Abstract
In this article, substoichiometric titanium oxide thin films (TiOX) are prepared with the reactive DC sputtering in an oxygen and argon atmosphere and then annealed in an oxygen atmosphere. Under a set of optimum deposition parameters, TiOX film with sheet resistance value of 167.9 KΩ/(box) and TCR value of -3.30%/K obtained. Transmittance of the optimum film is obtained in the 300≤λ≤1100nm wavelength range at room temperature. Thickness, near-infrared absorptance, and other properties of the optimum film are also investigated in this paper.
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Jing Jiang, Zhiming Wu, Yadong Jiang, Tao Wang, He Yu, "Investigations on titanium oxide film as an alternative heat sensitive material", Proc. SPIE 7513, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Process Technology, 751315 (25 November 2009); doi: 10.1117/12.837590; http://dx.doi.org/10.1117/12.837590
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KEYWORDS
Resistance

Oxygen

Annealing

Titanium

Oxides

Thin films

Sputter deposition

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