Paper
12 October 2009 Structural and optical properties of Bi2VO5.5 thin films deposited on silicon substrates
Zhenlun Zhang, Zhipeng Liu, Ming Guo, Pingxiong Yang
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Abstract
Ferroelectric Bi2VO5.5 (BVO) thin films have been successfully fabricated on p-type Si (100) substrates by sol-gel method. The microstructures and surface morphologies of BVO thin films were studied by X-ray diffraction and atomic force microscopy, respectively. Bi2VO5.5 thin films show c-preferred orientation, which indicates that the films match very well with the p-type Si substrate. Raman spectra measurements were carried out to study the lattice vibration modes of BVO thin films. Optical properties of the BVO were investigated due to their potential optical applications. And the optical properties of the BVO thin films have been studied by spectroscopic ellipsometric measurements in the wavelength from 400 nm to 1700 nm. The optical constant refractive index and extinction coefficient have been obtained. The resulting refractive index and extinction coefficient of BVO films show difference due to the different annealing process of the films, which implies the importance of the post annealing process. The increase of the refractive index could be understood by the higher density of the BVO films caused by the crystallization after annealing process. The Optical properties indicate that BVO films have potential applications in optical devices.
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Zhenlun Zhang, Zhipeng Liu, Ming Guo, and Pingxiong Yang "Structural and optical properties of Bi2VO5.5 thin films deposited on silicon substrates", Proc. SPIE 7518, Photonics and Optoelectronics Meetings (POEM) 2009: Solar Cells, Solid State Lighting, and Information Display Technologies, 75180Y (12 October 2009); https://doi.org/10.1117/12.843213
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KEYWORDS
Thin films

Refractive index

Annealing

Optical properties

Silicon

Raman spectroscopy

Crystals

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