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11 December 2009 EUV sensitive photo-acid generator sans chromophore
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Proceedings Volume 7520, Lithography Asia 2009; 75200R (2009)
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Recent advances in EUVL lithography is mainly centered on improving the RLS trade-off by employing new resist platforms, bulkier PAGs, EUV sensitizers etc. Among the several new kinds of PAGs proposed till date, the focus of development was mainly on the acid strength, compatibility with resin etc., whilst always retaining the mono, Di or tri phenyl chromophore of the PAG. Herein we report on the use of chromophore-less PAG for the patterning of EUVL resists. Resist performance using model acrylate and PHS based resist was studied. The patterned resists were characterized using SEM. Thermal stability of the PAG was compared with model chromophore containing PAG.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Subramanya Mayya, Yool Kang, Takahiro Yasue, Seok-Hwan Oh, Seong-Woon Choi, and Chan-Hoon Park "EUV sensitive photo-acid generator sans chromophore", Proc. SPIE 7520, Lithography Asia 2009, 75200R (11 December 2009);

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