12 December 2009 Fast converging inverse lithography algorithm incorporating image gradient descent methods
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Proceedings Volume 7520, Lithography Asia 2009; 75200V (2009) https://doi.org/10.1117/12.837514
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Abstract
In this paper, we develop an image-gradient-based algorithm to simultaneously optimize various cost functions for inverse mask design. The algorithm employs an iterative approach which evaluates the gradient decent of the resist image, aerial image, and the aerial image contrast with a pre-assigned step length. Moreover, an independent iteration step is inserted among iterations for binary mask conversion. We show that the proposed algorithm allows fast convergence while achieving high aerial image contrast. The impacts of each cost function on the pattern fidelity and convergence are also discussed.
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Jue-Chin Yu, Jue-Chin Yu, Peichen Yu, Peichen Yu, } "Fast converging inverse lithography algorithm incorporating image gradient descent methods", Proc. SPIE 7520, Lithography Asia 2009, 75200V (12 December 2009); doi: 10.1117/12.837514; https://doi.org/10.1117/12.837514
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