11 December 2009 Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems
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Proceedings Volume 7520, Lithography Asia 2009; 75200Y (2009) https://doi.org/10.1117/12.837035
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
This paper describes the principle and performance of a fully programmable illuminator for a high-NA immersion system. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. All mirrors are always used to create the source such that no light is lost when switching from one source shape to another. Measured sources generated with this new type of illumination system will be shown and compared to the target sources generated by source mask optimization software or targets of traditional sources. Comparison between measured and target source will be done both in parameters of a pupil fit model and by simulated imaging impact. Also the first results in resist obtained on a XTIV 1950Hi 1.35 NA tool equipped with this illuminator are presented and compared to measurements on the same system when it was equipped with an Aerial XP illumination system.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Melchior Mulder, Melchior Mulder, André Engelen, André Engelen, Oscar Noordman, Oscar Noordman, Robert Kazinczi, Robert Kazinczi, Gert Streutker, Gert Streutker, Bert van Drieenhuizen, Bert van Drieenhuizen, Stephen Hsu, Stephen Hsu, Keith Gronlund, Keith Gronlund, Markus Degünther, Markus Degünther, Dirk Jürgens, Dirk Jürgens, Johannes Eisenmenger, Johannes Eisenmenger, Michael Patra, Michael Patra, Andras Major, Andras Major, } "Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems", Proc. SPIE 7520, Lithography Asia 2009, 75200Y (11 December 2009); doi: 10.1117/12.837035; https://doi.org/10.1117/12.837035

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