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11 December 2009 Latest results from the Nikon NSR-S620 double patterning immersion scanner
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Proceedings Volume 7520, Lithography Asia 2009; 75200Z (2009)
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Double patterning (DP), an extension of immersion, is the leading contender for the manufacturing of 32 nm half pitch node devices. For DP, substantial improvement in overlay accuracy is required to meet the CDU requirements for the 32 nm node, and substantial increase in throughput is required to meet the cost requirements. To meet these challenges, Nikon introduced the NSR-S620. The S620 is based on the Streamlign platform, which is characterized by three innovations: Bird's Eye Control, Stream Alignment, and Modular2 Structure. In addition, many of the current systems and techniques have been refined to meet the requirements for DP. This presentation will discuss these technological improvements and show the latest technical results.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuhiro Hirano, Yuichi Shibazaki, Masato Hamatani, Jun Ishikawa, and Yasuhiro Iriuchijima "Latest results from the Nikon NSR-S620 double patterning immersion scanner", Proc. SPIE 7520, Lithography Asia 2009, 75200Z (11 December 2009);

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