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11 December 2009 Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing
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Proceedings Volume 7520, Lithography Asia 2009; 752013 (2009) https://doi.org/10.1117/12.839803
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Abstract
The ability to extend deep ultraviolet (DUV) lithography into the 32 and sub-32nm domain has more recently relied on improvements in source-mask optimization (SMO), double patterning (DP) and complex, pixellated illumination patterns. Yet these techniques require a commensurate improvement in the light source that powers the latest generation scanners in order to enable high performance at high throughput. This paper will show detailed performance results of the latest-generation light source from Cymer that incorporates flexible power with dramatic improvements in dose, wavelength and bandwidth stability.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Slava Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Daniel Riggs, Mary Haviland, Theodore Cacouris, and Daniel Brown "Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing", Proc. SPIE 7520, Lithography Asia 2009, 752013 (11 December 2009); https://doi.org/10.1117/12.839803
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